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Rutheniumfilm is an experimental solution which deposits ruthenium after spinning and baking as suggested below:


Spin Speed - 1000 rpm to 3000 rpm
Bake 150oC to 200oC, 15 minutes in air.
400oC, 15 minutes in air.

After this heat treatment one will obtain a sheet resistivity of approximately 150 ohms/square, when the film is applied at 1000 rpm spin speed. Further heating at 800oC in N2 will yield lower sheet resistivity in the range of 20 to 50 ohms/square. Rutheniumfilm resists all common etches - acid or alkali. To produce patterned films one may use the lift-off process with either Silicafilm 10,000 as the underlying substrate or photo resist itself.

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