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Titaniumsilicafilm is a spin-on formulation which yields glassy films containing TiO2 and SiO2. These films form anti-reflective coatings for a variety of applications.

Emulsitone prepares three standard formulations:

Titaniumsilicafilm A Index of Refraction 1.80
Titaniumsilicafilm B Index of Refraction 1.90
Titaniumsilicafilm C Index of Refraction 1.96

Additionally, we can formulate a film yielding any Index of Refraction from 1.50 - 2.00. All of these solutions yield films of approximately 1000 Angstroms thick when applied at 3000 rpm spin speed. Thinner films may be obtained by diluting the solution with ethyl alcohol or by increasing the spin speed.

Titaniumsilicafilm will wet all glass substrates as well as silicon. However, best results will be obtained on silicon wafers when the surface of the wafer is hydrophilic. The usual surface treatments such as chromic acid-sulfuric acid, H2O2 + H2SO4, or simple heating in air at 200oC will produce a suitable silicon surface.

After spinning, the substrate should be baked at 200oC for 15 minutes, followed by a 400oC bake for 15 minutes. Air is a suitable ambient.

Films of Titaniumsilicafilm may be removed by soaking in dilute HF solution followed by a spray of water to wash away the TiO2 particles which do not dissolve in HF.

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Material Safety Data Sheet